该过程在晶圆表面均匀涂覆一种名为光刻胶的光敏剂。
光刻胶涂层是半导体制造中的一个关键步骤,具体在光刻工艺中。在此过程中,半导体晶圆会进行旋涂,即通过快速旋转将液态光刻胶均匀地涂覆在晶圆表面。随后,进行软烘烤以去除溶剂并增强附着力。半导体制造的成功在很大程度上取决于光刻胶涂层过程中所达到的精度和均匀性。正性光刻胶和负性光刻胶的选择以及软烘烤和硬烘烤步骤的精心执行,对于确定后续工艺的有效性起着至关重要的作用。
借助滨松的在线湿法工艺浓度监测解决方案,提升半导体制造效率。探索我们专为实时、准确监测湿法工艺中的化学浓度而设计的先进技术。了解滨松如何革新在线监测技术,确保对化学过程进行精准控制和优化,以实现卓越的半导体生产。
借助滨松先进的晶圆污染检查解决方案,确保半导体生产纯净无瑕。探索我们精心打造的精明技术,用于精准检测污染物,保护半导体晶圆免受杂质污染。了解滨松在晶圆检查领域的专业知识如何为半导体制造过程树立可靠性和质量标准。
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